E. Rohrer et al., SUB-BANDGAP SPECTROSCOPY OF CHEMICAL-VAPOR-DEPOSITION DIAMOND, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 115-118
Sub-bandgap absorption of chemical vapor deposition (CVD) diamond grow
n on silicon was investigated by the constant photocurrent method (CPM
), transmission/reflection measurements, electron spin resonance (ESR)
and light-induced electron spin resonance (LESR). The CPM spectra of
nominally undoped and nitrogen doped samples show distinct nitrogen fe
atures around 2.3 and 3.3 eV usually found in type Ib synthetic diamon
d and broad absorption bands most likely due to amorphous carbon. W-il
lumination reduces the absorption coefficient in the range 4.2-5.2 eV
and gives rise to occupation of a defect level at 1.2 eV. The density
of carbon dangling bond defects deduced by ESR (g = 2.0029) increases
linearly with the nitrogen content. Paramagnetic nitrogen (P1 center,
g = 2.0024) is detected only under W-illumination in samples with N >
35 ppm. In films containing less than 35 ppm nitrogen, only 1-5% of th
e incorporated nitrogen is paramagnetic and therefore located at an is
olated substitutional site. (C) 1997 Published by Elsevier Science S.A
.