SUB-BANDGAP SPECTROSCOPY OF CHEMICAL-VAPOR-DEPOSITION DIAMOND

Citation
E. Rohrer et al., SUB-BANDGAP SPECTROSCOPY OF CHEMICAL-VAPOR-DEPOSITION DIAMOND, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 115-118
Citations number
14
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
46
Issue
1-3
Year of publication
1997
Pages
115 - 118
Database
ISI
SICI code
0921-5107(1997)46:1-3<115:SSOCD>2.0.ZU;2-G
Abstract
Sub-bandgap absorption of chemical vapor deposition (CVD) diamond grow n on silicon was investigated by the constant photocurrent method (CPM ), transmission/reflection measurements, electron spin resonance (ESR) and light-induced electron spin resonance (LESR). The CPM spectra of nominally undoped and nitrogen doped samples show distinct nitrogen fe atures around 2.3 and 3.3 eV usually found in type Ib synthetic diamon d and broad absorption bands most likely due to amorphous carbon. W-il lumination reduces the absorption coefficient in the range 4.2-5.2 eV and gives rise to occupation of a defect level at 1.2 eV. The density of carbon dangling bond defects deduced by ESR (g = 2.0029) increases linearly with the nitrogen content. Paramagnetic nitrogen (P1 center, g = 2.0024) is detected only under W-illumination in samples with N > 35 ppm. In films containing less than 35 ppm nitrogen, only 1-5% of th e incorporated nitrogen is paramagnetic and therefore located at an is olated substitutional site. (C) 1997 Published by Elsevier Science S.A .