INFLUENCE OF GROWTH-CONDITIONS ON THE STRUCTURAL PERFECTION OF BETA-SIC EPITAXIAL LAYERS FABRICATED ON 6H-SIC SUBSTRATES BY VACUUM SUBLIMATION

Citation
An. Andreev et al., INFLUENCE OF GROWTH-CONDITIONS ON THE STRUCTURAL PERFECTION OF BETA-SIC EPITAXIAL LAYERS FABRICATED ON 6H-SIC SUBSTRATES BY VACUUM SUBLIMATION, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 141-146
Citations number
20
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
46
Issue
1-3
Year of publication
1997
Pages
141 - 146
Database
ISI
SICI code
0921-5107(1997)46:1-3<141:IOGOTS>2.0.ZU;2-Z
Abstract
We report on the influence of the surface quality of substrate, growth rate and vapour phase composition in the growth cell on, both, the si ze of double position twins (and correspondingly the density of double position boundaries) in beta-SiC epitaxial layers and on the perfecti on of interfacial layers in beta-SiC/6H-SiC structures. The growth of beta-SiC was done by vacuum sublimation on the (0001)Si-face of 6H-SiC Lely substrates. Epitaxial layers of beta-SiC, with 5-6 mm(2) double position twins and low (10(1)-10(2) cm(2)) defect density, have been g rown. The resulting beta-SiC/6H-SiC heterostructures had no damaged in termediate layers at the interface. (C) 1997 Published by Elsevier Sci ence S.A.