An. Andreev et al., INFLUENCE OF GROWTH-CONDITIONS ON THE STRUCTURAL PERFECTION OF BETA-SIC EPITAXIAL LAYERS FABRICATED ON 6H-SIC SUBSTRATES BY VACUUM SUBLIMATION, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 141-146
We report on the influence of the surface quality of substrate, growth
rate and vapour phase composition in the growth cell on, both, the si
ze of double position twins (and correspondingly the density of double
position boundaries) in beta-SiC epitaxial layers and on the perfecti
on of interfacial layers in beta-SiC/6H-SiC structures. The growth of
beta-SiC was done by vacuum sublimation on the (0001)Si-face of 6H-SiC
Lely substrates. Epitaxial layers of beta-SiC, with 5-6 mm(2) double
position twins and low (10(1)-10(2) cm(2)) defect density, have been g
rown. The resulting beta-SiC/6H-SiC heterostructures had no damaged in
termediate layers at the interface. (C) 1997 Published by Elsevier Sci
ence S.A.