C. Hemmingsson et al., CAPACITANCE TRANSIENT STUDIES OF ELECTRON-IRRADIATED 4H-SIC, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 336-339
Deep level defects in electron-irradiated 4H-SiC epilayers grown by ch
emical vapor deposition (CVD were studied using deep level transient s
pectroscopy (DLTS). DLTS measurements performed on electron-irradiated
p (+) n junctions in the temperature range 100-750 K have revealed se
ven electron traps. Most of these defects were already observed at a d
ose of irradiation as]oa as 5 x 10(13) cm(-2). Dose dependence and ann
ealing behaviour of the defects were investigated. For two of these el
ectron traps, the capture cross section was measured. (C) 1997 Elsevie
r Science S.A.