CAPACITANCE TRANSIENT STUDIES OF ELECTRON-IRRADIATED 4H-SIC

Citation
C. Hemmingsson et al., CAPACITANCE TRANSIENT STUDIES OF ELECTRON-IRRADIATED 4H-SIC, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 336-339
Citations number
8
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
46
Issue
1-3
Year of publication
1997
Pages
336 - 339
Database
ISI
SICI code
0921-5107(1997)46:1-3<336:CTSOE4>2.0.ZU;2-N
Abstract
Deep level defects in electron-irradiated 4H-SiC epilayers grown by ch emical vapor deposition (CVD were studied using deep level transient s pectroscopy (DLTS). DLTS measurements performed on electron-irradiated p (+) n junctions in the temperature range 100-750 K have revealed se ven electron traps. Most of these defects were already observed at a d ose of irradiation as]oa as 5 x 10(13) cm(-2). Dose dependence and ann ealing behaviour of the defects were investigated. For two of these el ectron traps, the capture cross section was measured. (C) 1997 Elsevie r Science S.A.