Thin film cracking and ratcheting caused by temperature cycling

Citation
M. Huang et al., Thin film cracking and ratcheting caused by temperature cycling, J MATER RES, 15(6), 2000, pp. 1239-1242
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
15
Issue
6
Year of publication
2000
Pages
1239 - 1242
Database
ISI
SICI code
0884-2914(200006)15:6<1239:TFCARC>2.0.ZU;2-X
Abstract
Layered materials are susceptible to failure upon temperature cycling. This paper describes an intriguing mechanism: cracking in a brittle layer cause d by ratcheting in an adjacent ductile layer. For example, on a silicon die directly attached to an organic substrate, cracking often occurs in the si licon nitride film over aluminum pads. The silicon die and the organic subs trate have different thermal expansion coefficients, inducing shear stresse s at the die corners. Aided by cycling temperature, the shear stresses caus e ratcheting in the aluminum pads. Incrementally, the stress relaxes in the aluminum pads and builds up in the overlaying silicon nitride film, leadin g to cracks.