K. Nishimura et al., Structural characterization of boron-doped submicron vapor-grown carbon fibers and their anode performance, J MATER RES, 15(6), 2000, pp. 1303-1313
Structural evolution of undoped and boron-doped submicron vapor-grown carbo
n fibers (S-VGCFs) was monitored as a function of heat-treatment temperatur
e (HTT). Based on x-ray and Raman data, over the range of HTT from 1800 to
2600 degrees C, it was found that boron atoms act as catalysts to promote g
raphitization due to boron's higher diffusivity. For the range of HTT from
2600 to 2800 degrees C, the process of boron out-diffusion from the host ma
terial induces defects, such as tilt boundaries; this process would be rela
ted with the improved capacity and Coulombic efficiency of boron-doped S-VG
CFs. When 10 wt% S-VGCFs was used as an additive to synthetic graphite, the
cyclic efficiency of the capacities was improved to almost 100%.