The influence of adsorption gases for characteristics of the deposited films of 6-dibutylamino-1,3,5-triazine-2,4-dithiol on metal surfaces

Films of 6-dibutylamino-1,3,5-triazine-2.4-dithiol (DB) were formed on the metal substrate by the conventional vacuum deposition method. The metal sub strates were treated by baking and unbaking under ultra high vacuum conditi on to remove adsorbed gases. Adsorption probability, desorption, and molecu lar structures of DB were investigated using ellipsometry and XPS about the influence of substrate cleanliness for adsorption gases. The results showe d that the adsorption probability of DB was small on the baked substrate co mpared the with the unbaked substrate within a few nm thickness of the film , and the desorption of DB did not occur easily on the surface of the unbak ed substrate. The structure characterized with XPS showed DB molecules form ed easily disulfide bonds and mercaptide bonds on the unbaked substrate sur face. It is suggested that adsorbed gases on metal substrates originated po lymerization of DB and chemical adsorption to the metal surface.