Copper dissolution behavior in acidic iodate solutions

Authors
Citation
Ql. Luo, Copper dissolution behavior in acidic iodate solutions, LANGMUIR, 16(11), 2000, pp. 5154-5158
Citations number
18
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
16
Issue
11
Year of publication
2000
Pages
5154 - 5158
Database
ISI
SICI code
0743-7463(20000530)16:11<5154:CDBIAI>2.0.ZU;2-V
Abstract
Copper dissolution was investigated using electrochemical techniques includ ing potentiodynamic scans and electrochemical quartz crystal analysis. The adsorption of iodate on a copper surface depends on the solution pH and the concentration of iodate. IO3- behaves both as an oxidizer and a passivatin g agent for copper dissolution. At low IO3- concentrations, IO3- acts more like an oxidizer while it passivates the copper surface at higher concentra tions. The copper dissolution rate decreases with increasing solution pH an d increases with increasing concentration of potassium iodate up to 1 wt %. The dissolution rate does not change significantly when the potassium ioda te concentration is >1 wt %. A strong adsorption of IO3- ions on a copper S urface has been observed at higher solution pH's and higher iodate concentr ations. This may be ascribed to the formation of a thin film of Cu(IO3)(2) due to the high surface CU2+ concentration and higher concentration of IO3- adjacent to the copper surface.