Copper dissolution was investigated using electrochemical techniques includ
ing potentiodynamic scans and electrochemical quartz crystal analysis. The
adsorption of iodate on a copper surface depends on the solution pH and the
concentration of iodate. IO3- behaves both as an oxidizer and a passivatin
g agent for copper dissolution. At low IO3- concentrations, IO3- acts more
like an oxidizer while it passivates the copper surface at higher concentra
tions. The copper dissolution rate decreases with increasing solution pH an
d increases with increasing concentration of potassium iodate up to 1 wt %.
The dissolution rate does not change significantly when the potassium ioda
te concentration is >1 wt %. A strong adsorption of IO3- ions on a copper S
urface has been observed at higher solution pH's and higher iodate concentr
ations. This may be ascribed to the formation of a thin film of Cu(IO3)(2)
due to the high surface CU2+ concentration and higher concentration of IO3-
adjacent to the copper surface.