Fabrication of pseudo-spin-valves and 100 nm sized periodic elements for magnetic memory application

Citation
Jq. Wang et al., Fabrication of pseudo-spin-valves and 100 nm sized periodic elements for magnetic memory application, MAT SCI E B, 76(1), 2000, pp. 1-5
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
76
Issue
1
Year of publication
2000
Pages
1 - 5
Database
ISI
SICI code
0921-5107(20000615)76:1<1:FOPA1N>2.0.ZU;2-T
Abstract
Co-Cu -Co pseudo spin-valves (PSV's) and Co-Cu multilayers have been fabric ated and studied for the giant magnetoresistance (GMR) effect. Attention is focused on optimizing the low field response. They are deposited on Si (00 1) wafers without removing the natural silicon-dioxide layer, using S-resea rch sputtering guns in high vacuum. A buffer layer of Cr-Cu was used before depositing the PSVs. Realization magnetic switching at low field for the s oft layer and high field for the hard-layer makes the structure suited for MRAM application. The low and high switching fields are typically 100 and 2 200 Oe, respectively. The magnetic measurement using SQUID magnetometry and VSM confirms the switching fields in the hysteresis loops of the magnetiza tion. The GMR multilayers have a low switching field of 60 Oe at low temper atures. They are patterned into two-dimensional 100 nm sized periodic dot-a rray using ultraviolet interferometric lithography. The purpose is to devel op processes of fabricating GMR structures over large areas with nanometer feature sizes for high-density memory devices. The coercive field for the p atterned structures is enhanced by a factor of four at low temperatures and by a small fraction at higher temperatures. The magnetization remains to b e in plane as in un-patterned case. (C) 2000 Elsevier Science S.A. All righ ts reserved.