The doping process of p-type GaN films

Citation
Gc. Chi et al., The doping process of p-type GaN films, MAT SCI E B, 75(2-3), 2000, pp. 210-213
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
75
Issue
2-3
Year of publication
2000
Pages
210 - 213
Database
ISI
SICI code
0921-5107(20000601)75:2-3<210:TDPOPG>2.0.ZU;2-C
Abstract
The formation of p-type GaN him is a key technology in developing optoelect ronic devices. P-type doping (concentration similar to 10(17) cm(-3)) has b een achieved in grown GaN by metalorganic chemical vapor deposition (MOCVD) with Mg (CP2Mg) doping. The Hall measurement results indicate that Mg diff used GaN films also have p-type conductivity with carrier concentration abo ut 10(17) cm(-3) and a mobility of 10 cm(2) V-1 s(-1). For the as-grown Mg- doped GaN, the room temperature photoluminescence (PL) spectra show a blue emission peak around 420-450 nm, and the spectral peak depends on the carri er concentrations. For Mg-diffused GaN, the PL spectra shows only a broad v iolet emission for samples diffused at 900-1100 degrees C. (C) 2000 Elsevie r Science S.A. All rights reserved.