Photoresponse of YBa2Cu3O7-x films in the flux creep regime

Citation
Il. Landau et Hr. Ott, Photoresponse of YBa2Cu3O7-x films in the flux creep regime, PHYSICA B, 284, 2000, pp. 793-794
Citations number
2
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
284
Year of publication
2000
Part
1
Pages
793 - 794
Database
ISI
SICI code
0921-4526(200007)284:<793:POYFIT>2.0.ZU;2-5
Abstract
We have studied the effect of illumination on the flux creep in an epitaxia l YBa2Cu3O7-x film in a wide range of temperatures. A ring-shaped film was used to obtain voltage-current (V-I) characteristics without applying elect rical contacts. It is shown that illumination substantially alters the deri vative d ln Y/dI. The effect is particularly strong at low temperatures whe re d ln V/dI for the illuminated sample is almost an order of magnitude sma ller than that without illumination. A temperature increase weakens the eff ect which vanishes at approximately 35 K. The effect of illumination on d l n V/dI is practically independent of the light intensity between 5 and 100 klux and it is still remarkable even for illuminations as weak as 30 lux. ( C) 2000 Elsevier Science B.V. All rights reserved.