To obtain smooth NBCO thin films by sputtering, we have investigated the co
rrelation of surface morphology with amounts of Nd-Ba substitution (x). Sur
face morphology and crystal structure of NBCO thin film were influenced by
x. NBCO thin films deposited by optimum conditions showed a T-c of 95.4 K a
nd current density of 10(6) A/cm(2). AFM observation revealed that the line
scan surface roughness was 5.5 nm over an area of 5 mu m(2). A variation o
f surface morphology by substitution of Nd and Ba ions was discussed. (C) 2
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