Nitrogen-induced levels in GaAs1-xNx studied with resonant Raman scattering

Citation
Hm. Cheong et al., Nitrogen-induced levels in GaAs1-xNx studied with resonant Raman scattering, PHYS REV B, 61(20), 2000, pp. 13687-13690
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
61
Issue
20
Year of publication
2000
Pages
13687 - 13690
Database
ISI
SICI code
0163-1829(20000515)61:20<13687:NLIGSW>2.0.ZU;2-2
Abstract
Resonant Raman scattering is used to study the nature of the recently disco vered nitrogen-induced level E+ located in the conduction band of GaAs1-xNx (0.001 less than or equal to x less than or equal to 0.022). Our data demo nstrate that the E+ state is derived from the nitrogen-induced T-L mixing o f the bulk GaAs states;and that it is no an isolated nitrogen impurity leve l. A broadening of the GaAs-like longitudinal-optical phonon-line and an en hancement of the transverse-optical phonon line is observed near resonance, which is interpreted as being due to resonance with strongly localized sta tes.