Two-dimensional distribution of As atoms doped in a Si crystal by atomic-resolution high-angle annular dark field STEM

Citation
T. Yamazaki et al., Two-dimensional distribution of As atoms doped in a Si crystal by atomic-resolution high-angle annular dark field STEM, PHYS REV B, 61(20), 2000, pp. 13833-13839
Citations number
32
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
61
Issue
20
Year of publication
2000
Pages
13833 - 13839
Database
ISI
SICI code
0163-1829(20000515)61:20<13833:TDOAAD>2.0.ZU;2-D
Abstract
Observation of arsenic doped silicon has been made by using Z-contrast imag es of high-angle annular dark held scanning transmission electron microscop y with a tightly focused electron probe. The images show characteristic exc ess brightness depending on the number of arsenic atoms per atomic column. Through a simple analysis capable of identifying the number of arsenic atom s in an atomic column by using the above characteristic brightness, the qua ntitative two-dimensional distribution of arsenic atoms can be successfully obtained at atomic resolution, being consistent with the secondary ion mas s spectroscopy and Rutherford backscattering spectroscopy measurements. Thi s method is the only capable technique for detecting impurity atoms in ever y atomic column.