Expanding capabilities in existing fabs with lithography tool-matching

Rotated nonconcentric matching of advanced lithography tools to an installe d base of older tools is emerging as a viable technique for production wafe r fabs. The technique involves use of common matching reticles and golden s tandard wafers. When properly applied, this technique enables improved repe atability of a process from tool-to-tool and from day-to-day. As lithograph y technology evolves, the matching process facilitates the integration of t ools with different capabilities into the fabrication process, optimizing p rocess flow and in turn, increasing process yield, without the high capital outlay required to outfit an entire fab with the most advanced tool.