Simulation of GaN/AlGaN heterojunction bipolar transistors: part I - npn structures

Citation
Xa. Cao et al., Simulation of GaN/AlGaN heterojunction bipolar transistors: part I - npn structures, SOL ST ELEC, 44(7), 2000, pp. 1255-1259
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
7
Year of publication
2000
Pages
1255 - 1259
Database
ISI
SICI code
0038-1101(200007)44:7<1255:SOGHBT>2.0.ZU;2-W
Abstract
A drift-diffusion model was employed to calculate the de performance of GaN /AlGaN heterojunction bipolar transistors (HBTs). The dc current gain was f ound to vary from similar to 7 to 60 for collector currents of 10(-12)-10(- 2) A in 100 mu m contact diameter devices with 2000 Angstrom thick p-GaN ba se layers (P = 2 x 10(17) cm(-3)). The effects of base grading, base thickn ess, minority carrier lifetime and mobility in the base, base contact resis tance and device operating temperature (25-300 degrees C) were examined. Th e HBTs were found to have a significantly better gain at low collector curr ent densities than the GaN bipolar junction transistors, due to the valence band offset. (C) 2000 Elsevier Science Ltd. All rights reserved.