Characterization of amorphous aluminum oxide films prepared by the pyrosolprocess

Citation
A. Ortiz et al., Characterization of amorphous aluminum oxide films prepared by the pyrosolprocess, THIN SOL FI, 368(1), 2000, pp. 74-79
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
368
Issue
1
Year of publication
2000
Pages
74 - 79
Database
ISI
SICI code
0040-6090(20000601)368:1<74:COAAOF>2.0.ZU;2-P
Abstract
Amorphous aluminum oxide films were deposited by the pyrosol process using aluminum acetylacetonate as source material dissolved in a mixture of three parts of deionized water and one part of methanol. An accelerator ion beam analysis technique was used to obtain the areal density and the chemical c omposition of the aluminum oxide films, which result in being oxygen-rich w hen films are deposited at a substrate temperature of 480 degrees C. The in frared spectra show a broad-absorption band from 400 to 1000 cm(-1) typical of the vibrations of the Al2O3. LR analysis also shown that then are no O- H or alanol (Al-OH) groups incorporated in the films and that films kept at air atmosphere at room temperature have a high stability against water ads orption. The refractive index of the films measured by ellipsometry was 1.6 47. The optical transmission has a value of the order of 88% in the range f rom 400 to 900 nm for films deposited onto pyrex glass and fused quartz sli ces. There is no optical absorption edge for wavelengths around 190 nm, whi ch indicates that the deposited films have an energy band gap of at least 6 .2 eV. The current density-electric field characteristics of MIM structures , incorporating insulating aluminum oxide films, show current injection acr oss the film for electric fields higher than 2 MV/cm. Electric breakdown wa s not observed for applied electric fields of the order of 4.5 MV/cm. (C) 2 000 Elsevier Science S.A. All rights reserved.