On the possibility of the in situ growth control and nondestructive depth profiling of ultrathin multilayer structures using keV hydrogen ions

Citation
Va. Kurnaev et al., On the possibility of the in situ growth control and nondestructive depth profiling of ultrathin multilayer structures using keV hydrogen ions, VACUUM, 56(4), 2000, pp. 253-255
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
VACUUM
ISSN journal
0042207X → ACNP
Volume
56
Issue
4
Year of publication
2000
Pages
253 - 255
Database
ISI
SICI code
0042-207X(200003)56:4<253:OTPOTI>2.0.ZU;2-I
Abstract
Experiments with deuterium ion beams of 3-5 keV per deuteron as well as com puter simulations using the binary collision SCATTER code were used to anal yze energy distributions of particles scattered at a definite angle from mu ltilayer Mo/B4C structures with well-defined width of layers as a test targ et. A depth resolution of 0.3 nm is demonstrated. The influence of the geom etry of the scattering on the resolution and sensitivity of the method are also analyzed. (C) 2000 Elsevier Science Ltd. All rights reserved.