ADSORPTION AND DESORPTION PROPERTIES OF CU AND AG CONTAMINANTS ON SI SUBSTRATE

Adsorption and desorption mechanisms of noble metals (Cu and Ag) on a Si surface were investigated. From this research, we found that (1) wh en a bare Si substrate was dipped in 1 ppm Cu containing O-3-UPW (ozon ized ultrapure water), Cu adhered almost to the Si oxide surface and c ould be easily removed by a wet oxidation mode cleaning; (2) Ag acted as an oxidizing agent against Cu contaminants on the Si substrate and replaced it; (3) To prevent noble metallic contaminations on the Si su bstrate, pre-oxidation treatment was very effective.