GaN films of about 300 nm were grown on GaAs(001) substrates by molecular b
eam epitaxy (MBE). X-ray double-crystal diffraction and room-temperature ph
otoluminescence measurements show that the films grown on nitridized GaAs n
ucleation layer are pure cubic GaN while the films grown on nitridized AlAs
nucleation layer are pure hexagonal GaN. The present study shows that the
phase of GaN samples grown on GaAs substrates can be controlled using diffe
rent nucleation layers.