Mx. Wang et al., Negative resistance phenomenon and light emission property of the metal-insulator-semiconductor (Au-SiO2-Si) tunnel junction, ACT PHY C E, 49(6), 2000, pp. 1159-1162
The Au-SiO2-Si thin film MIS(Metal-Insulator-Semiconductor) tunnel junction
was fabricated. The light emission property and I-V characteristic of this
junction were measured and analyzed. Result indicated that the light emiss
ion was due to the excitation of Surface Plasmon Polariton(SPP)and the coup
le of SPP with the surface roughness subsequently in the MIS system. We obs
erved the negative resistance phenomenon(NRP) in the I-V curve of this MIS
junction,which was explained by the electrons bonding model. We also got th
e AFM(atomic force microscopy) photo of the surface of MIS junction, by whi
ch the relation among. the electrons tunneling, the excitation of SPP, and
the light emission of the MIS junction was discussed.