Pulsed-laser irradiation quantum well intermixing process in GaInAs/GaInAsP laser structures

Citation
Tk. Ong et al., Pulsed-laser irradiation quantum well intermixing process in GaInAs/GaInAsP laser structures, MICROEL ENG, 51-2, 2000, pp. 349-355
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
51-2
Year of publication
2000
Pages
349 - 355
Database
ISI
SICI code
0167-9317(200005)51-2:<349:PIQWIP>2.0.ZU;2-R
Abstract
We report the development and characterization of a postgrowth bandgap modi fication technique of GaInAs/GaInAsP laser structures utilizing a Q-switche d Nd:YAG laser with a pulse length of similar to 8 ns and repetition rate o f 10 Hz. Quantum well intermixing effect of the samples irradiated under pu lsed energy densities of 2.8, 3.5 and 3.9 mJ mm(-2) at different exposure t imes was studied. A maximum bandgap shift of up to 112 meV has been observe d from sample exposed to 3.9 mJ (-2) for 5 min after subsequent annealing i n a rapid thermal processor at 625 degrees C for 120 s. A spectrum broadeni ng of 3 mm meV, relative to the as-grown sample, was obtained from intermix ed sample exposed to 2.8 mJ mm(-2) for 1 min indicating that the quality of the material remains high. A differential bandgap shift of 60 meV has been obtained between a gold-masked region and laser-irradiated region. Lasers with bandgap tuned to 82 nm relative to the as-grown lasers have been fabri cated using this technique. (C) 2000 Elsevier Science B.V. All rights reser ved.