Temperature dependent effective ionization coefficient for Si

Citation
Ys. Chung et al., Temperature dependent effective ionization coefficient for Si, MICROEL ENG, 51-2, 2000, pp. 535-540
Citations number
4
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
51-2
Year of publication
2000
Pages
535 - 540
Database
ISI
SICI code
0167-9317(200005)51-2:<535:TDEICF>2.0.ZU;2-M
Abstract
Analytical expressions for temperature dependence of breakdown voltage and on-resistance of Si p + n diodes are derived successfully by employing the temperature dependent effective ionization coefficient and mobility in Si. The analytical results are compared with numerical simulations. The variati on of the on-resistance with temperature is also compared with the one repo rted previously. Good fits with the numerical results are found for the bre akdown voltage within 10% in error for the doping concentration in the rang e of 10(14)-10(17) cm(-3). (C) 2000 Elsevier Science B.V. All rights reserv ed.