Optical characterization of dielectric borophosphosilicate glass

Citation
M. Gartner et al., Optical characterization of dielectric borophosphosilicate glass, MICROEL REL, 40(4-5), 2000, pp. 617-620
Citations number
4
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
40
Issue
4-5
Year of publication
2000
Pages
617 - 620
Database
ISI
SICI code
0026-2714(200004/05)40:4-5<617:OCODBG>2.0.ZU;2-1
Abstract
Atmospheric pressure chemical vapour deposition films of borophosphosilicat e glass with different contents of phosphorus and boron can be successfully used as masks for etching of silicon in KOH solution. The optical properti es of these films were pointed out by spectroellipsometric measurements, us ing different theoretical models (such as Cauchy and Wemple-DiDomenico mode ls). (C) 2000 Elsevier Science Ltd. All rights reserved.