The stress induced leakage current (SILC) in Si/SiO2 structures with thin g
ate oxides has a steady-state component which increases drastically when th
e oxide thickness decreases. It is generally agreed that the SILC is due to
electron tunnelling trough stress-induced traps. However, it was observed
that the SILC, created by Fowler-Nordheim injection, decays continuously wh
en, after stress, the samples are positively or negatively biased at a low
voltage. The decay is irreversible as long as the gate oxide is not biased
at a high voltage. The present article adds complementary observations. It
shows, first that the above phenomenon is observed in 3.5 nm thick oxides,
secondly, that this phenomenon is stable as long as the temperature stays b
elow 200 degrees C, and thirdly, that during the SILC decay, the interface
state density does not diminish. (C) 2000 Elsevier Science Ltd. All rights
reserved.