M. Beichele et al., Reliability of ultra-thin N2O-nitrided oxides grown by RTP under low pressure and in different gas atmospheres, MICROEL REL, 40(4-5), 2000, pp. 723-726
Oxide reliability of oxynitrides with thicknesses between 3.6 and 2.6 nm wa
s investigated. The oxynitrides were grown at reduced pressure in gas atmos
pheres containing different ratios of N2O and O-2 concentrations. The conce
ntrations of the nitrogen incorporated into the oxide were found to be depe
ndent on both, oxidation pressure and oxidation ambience. Further, reliabil
ity tests revealed that the nitrogen concentration, which is beneficial to
oxide reliability, shows a strong dependence on oxide thickness. (C) 2000 E
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