ZrO2 layers stabilized with 9 mol% Y2O3 Of 35-100 nm thickness were deposit
ed by sputtering on 200 nm thick Fe layers on SiO2/Si, The samples were bom
barded with 300 kcV Kr ions at RT with doses ranging from 5 x 10(15) to 8 x
10(16) Kr/cm(2). They were analyzed by means of RES, GXRD, TEM and SEM tec
hniques. RES analysis revealed important atomic transport across the ZrO2/F
e interface. The amount of intermixed atoms increases with increasing ion d
ose. As-deposited ZrO2(Y2O3) layers have the tetragonal structure that was
transformed upon Kr-ion bombardment into the cubic one. Kr blistering was o
bserved for samples implanted with 300 keV Kr ions to doses exceeding 5 x 1
0(16) at./cm(2). The atomic transport of Zr and Fe across the ZrO2/Fe inter
face was apparently governed by ballistic ion-beam mixing. The long range m
igration of O atoms was also observed and is attributed to Fe oxidation. (C
) 2000 Elsevier Science B.V. All rights reserved.