Broad-band active channels induced by electron beam lithography in LiF films for waveguiding devices

For the first time, a confocal light scanning microscope (CLSM) in fluoresc ence mode was used to reconstruct the depth distribution of efficiently emi tting laser-active color centers (CCs) in a stripe-like region induced by 1 2 keV electrons on lithium fluoride (LiF) films thermally evaporated on gla ss. The formation of the F-3(+) and F-2 aggregate defects appears restricte d to the electron penetration and proportional to their energy depth profil e, as obtained from a Monte Carlo simulation. (C) 2000 Published by Elsevie r Science B.V. All rights reserved.