Using focussed ion beam writing we define an in-plane gate (IPG) modified w
ith a bay. Biasing this IPG modifies on the one hand the edge potential and
on the other hand the bay width. The first effect governs the interchannel
scattering, the second one the backscattering in general. We measure the l
ongitudinal resistance R-xx(B) for different gate voltages VG(ate). In the
quantum regime both effects are responsible for an increased dependence of
the R-xx(x)-peaks and especially of the neighbouring spin-split maxima rati
o on V-Gate compared to a simple IPG. A structure with a longer slit realiz
ed with two neighbouring IPGs is used to examine the backscattering in the
bay region. (C) 2000 Elsevier Science B.V. All rights reserved.