The technique of field-induced local oxidation with the tip of an atomic fo
rce microscope can be used to pattern non-noble metal thin films by creatin
g insulating regions. We have studied the technique (oxide line width, oxid
ation thickness, etc.) in order to fabricate mesoscopic electronic devices.
Ti thin film structures have been patterned as well as more complicated st
ructures where the Ti covers gold islands. (C) 2000 Elsevier Science B.V. A
ll rights reserved.