We studied the morphology of ramps in YBa2Cu3O7-delta films and, subsequent
ly, the barrier layer The ramps have been fabricated by Ar ion beam milling
using standard photoresist masks. SEM and AFM showed the formation of trac
ks along the slope of the ramp, originating from the irregular shape of the
edge of the photoresist mask. A proposed modified reflowed resist and pre-
annealing process show a significantly smoother ramp surface, important for
the fabrication of reproducible Josephson junctions.