Atomic relocations in a two-layer Al/Ni system bombarded with ions having energies close to the sputtering threshold

Citation
Gv. Kornich et al., Atomic relocations in a two-layer Al/Ni system bombarded with ions having energies close to the sputtering threshold, TECH PHYS L, 26(5), 2000, pp. 372-374
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS LETTERS
ISSN journal
10637850 → ACNP
Volume
26
Issue
5
Year of publication
2000
Pages
372 - 374
Database
ISI
SICI code
1063-7850(2000)26:5<372:ARIATA>2.0.ZU;2-L
Abstract
Collision cascades developed at 300 K in a Ni single crystal and in a syste m comprising a monolayer of Al atoms on the Ni(100) single crystal face bom barded at normal incidence by 25- and 50-eV Ar and Xe atoms were simulated by method of molecular dynamics. It was found that the number of atoms relo cated through the Al-Ni interface markedly exceeds the number of analogous relocations in the nickel single crystal. (C) 2000 MAIK "Nauka/Interperiodi ca".