Defect formation in a two-layer Al/Ni crystal bombarded with ions having energies close to the sputtering threshold

Citation
Gv. Kornich et al., Defect formation in a two-layer Al/Ni crystal bombarded with ions having energies close to the sputtering threshold, TECH PHYS L, 26(5), 2000, pp. 429-431
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS LETTERS
ISSN journal
10637850 → ACNP
Volume
26
Issue
5
Year of publication
2000
Pages
429 - 431
Database
ISI
SICI code
1063-7850(2000)26:5<429:DFIATA>2.0.ZU;2-O
Abstract
Atomic collision cascades developed in an Al/Ni system, comprising a monola yer of Al atoms on the Ni(100) single crystal face bombarded at normal inci dence by 25- or 50-eV Ar and Xe atoms, were simulated by means of molecular dynamics. It is shown that the number of Al atoms relocated within the fir st layer of the Al/Ni crystal markedly exceeds the number of analogous relo cations in a nickel single crystal, which is explained by differences in th e number of vacancies in the first layer of two systems, and in the lattice constants of Al and Ni. (C) 2000 MAIK "Nauka/Interperiodica".