Aerosol and plasma assisted chemical vapor deposition process for multicomponent oxide Lao(0.8)Sro(0.2)MnO(3) thin film

It has been of increasing interest to develop a chemical vapor deposition ( CVD) process to prepare thin films of multi-component oxides, such as fluor ite and perovskite type materials, which exhibit unique functional properti es and potential applications. The lack of the proper volatile precursors a nd the difiiculty in composition control are the major barriers to sluggish the achievement of this purpose. Recently, we developed an aerosol assiste d CVD method to deposit perovskite-type oxide La1-xSrxMnO3, a mixed oxygen ion/electron conductor. Furthermore, microwave plasma activation to the aer osol phase is applied to promote the deposition process. This paper reports briefly the preliminary results from this novel technique. (C) 2000 Elsevi er Science S.A. All rights reserved.