Diamond films with high quality were successfully deposited using a novel g
rowth method-two-step growth technique-in hot filament chemical vapor depos
ition (CVD) chamber. The characterization of diamond films were investigate
d by scanning electron microscopy and Raman scattering, which show noticeab
le improvement in quality of diamond films. The high surface resistivity of
diamond films was also investigated. It suggests that the decreasing of ac
tivated carbon concentration near the substrate surface and the increasing
of secondary nucleation density of diamond are responsible for the well-beh
aved diamond film growth. In addition, the thermal stability of the diamond
layer surface is also beneficial to the growth of the diamond film. (C) 20
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