In conventional molecular-beam epitaxy, atoms from a diffuse source randoml
y impinge upon a surface, accumulating in atomic layers or islands. We have
recently demonstrated an enhancement of this process, in which the traject
ories of the atoms are controlled with nanometer-scale resolution during de
position. Using the forces exerted by laser light tuned near an atomic tran
sition, an array of 'atom lenses' is formed, which focus, or concentrate th
e atoms into an array of lines or dots with size as small as 30 nm. This ne
w technique represents a novel form of nanofabrication that can create nano
meter-scale structures in parallel over a large (millimeter-size) area with
out the use of any resist or pattern-transfer techniques. (C) 2000 Elsevier
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