The near-surface morphology, crystalline quality and contamination as well
as depth and lateral homogeneity of background impurities and defects distr
ibution in undoped ZnSe and ZnTe films grown by molecular beam epitaxy on G
aAs(001) substrates were studied. The improvement of structural quality wit
h the increase of film thickness was observed by X-ray diffraction and atom
ic force microscope. But sufficient depth inhomogeneity of point and extend
ed defect distribution is present in all films independently on their thick
ness and increases after deposition of quantum wells. Transversal photovolt
age measurements confirm the laminar inhomogeneity of investigated films. (
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