Cation diffusion in MBE-grown CdTe layers

Citation
A. Seweryn et al., Cation diffusion in MBE-grown CdTe layers, THIN SOL FI, 367(1-2), 2000, pp. 220-222
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
367
Issue
1-2
Year of publication
2000
Pages
220 - 222
Database
ISI
SICI code
0040-6090(20000515)367:1-2<220:CDIMCL>2.0.ZU;2-Y
Abstract
The mechanisms of atomic diffusion in the cation sublattice of CdTe have be en studied. For the present study two types of CdTe layers have been grown by molecular beam epitaxy (MBE) at different Cd/Te flux ratio resulting in different stoichiometry of the matrix material. Each of the samples contain ed three build-in delta-like markers of MnTe, MgTe and ZnTe. From the sprea d of the cations out of the markers, caused by a thermal annealing, the dif fusivities of Mn, Mg, and Zn were determined by means of secondary ion beam spectrometry (SIMS). We found that the stoichiometry of the CdTe matrix st rongly influences on the diffusion activation energy but for a given matrix the activation energy does not depend on the diffusing species. For CdTe l ayer rich in Cd, the activation energies of cation diffusion for the three investigated cations are found to be around 1.3 eV, while in Te-rich matrix around 1.9 eV. This difference indicates that different diffusion mechanis ms operate in these two cases. Assuming the interstitial mechanism in the f ormer case and the vacancy mechanism in the latter, energies of the cation migration in CdTe and of Cd vacancy formation are estimated to be equal to 1.3 and 0.6 eV, respectively. (C) 2000 Elsevier Science S.A. All rights res erved.