Highly spin-polarized chromium dioxide thin films prepared by chemical vapor deposition from chromyl chloride

Highly spin-polarized chromium dioxide (CrO2) thin films were deposited on (100) TiO2 substrates by chemical vapor deposition using chromyl chloride a s a precursor. The spin polarization, as measured by the point contact Andr eev reflection technique, was 81 +/- 3%. X-ray diffraction theta/2 theta sc ans indicated the films grew completely (100) oriented, in registry with th e (100) oriented TiO2 substrate. X-ray diffraction phi scans on the CrO2 (1 10) reflection indicated the expected twofold symmetry, with no evidence of misaligned material. The resistivity at room temperature was 240 mu Omega cm and decreased to 10 mu Omega cm at 5 K, consistent with metallic behavio r. The films were ferromagnetic with a Curie temperature of 395 K and a coe rcivity of similar to 100 Oe at 298 K. The use of chromyl chloride as a pre cursor resulted in efficient and controlled CrO2 film growth. (C) 2000 Amer ican Institute of Physics. [S0003-6951(00)04125-5].