The results of studies of patterned growth of vertically aligned carbon nan
ofibers (VACNFs) prepared by plasma-enhanced chemical vapor deposition are
reported. Nickel (Ni) dots of various diameters and Ni lines with variable
widths and shapes were fabricated using electron beam lithography and evapo
ration, and served for catalytic growth of VACNFs whose structure was deter
mined by high resolution transmission electron microscopy. It is found that
upon plasma pre-etching and heating up to 600-700 degrees C, thin films of
Ni break into droplets which initiate the growth of VACNFs. Above a critic
al dot size multiple droplets are formed, and consequently multiple VACNFs
grow from a single evaporated dot. For dot sizes smaller than the critical
size only one droplet is formed, resulting in a single VACNF. In the case o
f a patterned line, the growth mechanism is similar to that from a dot. VAC
NFs grow along the line, and above a critical linewidth multiple VACNFs are
produced across the line. The mechanism of the formation of single and mul
tiple catalyst droplets and subsequently of VACNFs is discussed. (C) 2000 A
merican Institute of Physics. [S0003-6951(00)00824-X].