Electronic structure and energy band gap of poly (9,9-dioctylfluorene) investigated by photoelectron spectroscopy

Citation
Ls. Liao et al., Electronic structure and energy band gap of poly (9,9-dioctylfluorene) investigated by photoelectron spectroscopy, APPL PHYS L, 76(24), 2000, pp. 3582-3584
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
24
Year of publication
2000
Pages
3582 - 3584
Database
ISI
SICI code
0003-6951(20000612)76:24<3582:ESAEBG>2.0.ZU;2-R
Abstract
The electronic structure of poly (9,9-dioctylfluorene) (PFO) film on a Au-c oated Si substrate was investigated by ultraviolet photoelectron spectrosco py (UPS) and x-ray photoelectron spectroscopy (XPS). From the UPS measureme nt, we obtained the ionization potential (Ip) of the PFO film, Ip = 5.60 +/ - 0.05 eV. From the XPS shake-up peaks of the C1s core level, we estimated the electron energy band gap (E-g) of the film, E-g = 3.10 +/- 0.10 eV. By comparing the E-g with the optical absorption gap, we found that the value of E-g is closer to the optical absorption maximum than to the optical abso rption edge. Therefore, we suggest that the optical absorption maximum may be a better approximation than the optical absorption edge in estimating E- g. (C) 2000 American Institute of Physics. [S0003-6951(00)00924-4].