Optical spectroscopy of GaN grown by metalorganic vapor phase epitaxy using indium surfactant

Citation
G. Pozina et al., Optical spectroscopy of GaN grown by metalorganic vapor phase epitaxy using indium surfactant, APPL PHYS L, 76(23), 2000, pp. 3388-3390
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
23
Year of publication
2000
Pages
3388 - 3390
Database
ISI
SICI code
0003-6951(20000605)76:23<3388:OSOGGB>2.0.ZU;2-Z
Abstract
The effect of In surfactant during metalorganic vapor phase epitaxial growt h on sapphire substructure on the properties of GaN layers is studied using time-resolved photoluminescence. cathodoluminescence. and scanning electro n microscopy. The samples are divided into two groups. where hydrogen and n itrogen, respectively, have been used as a carrier gas during growth. It is shown that In-doped samples have a lower dislocation density, a narrower p hotoluminescence linewidth, and a longer foe exciton lifetime. The influenc e of indium is stronger for GaN layers grown in nitrogen-rich conditions. T he improvements of structural and optical properties are attributed to the effect of In on dislocations. (C) 2000 American Institute of Physics. [S000 3-6951(00)02723-6].