Exposure method using photoresist mask for high-density optical disk mastering

A high-density digital versatile disk (HD-DVD) is being developed, aiming f or high definition television. It is thought that the capacity of HD-DVD wo uld be 15 GB. for example when its track pitch is 0.42 mu m, its minimum ma rk length must be 0.22 mu m. To fabricate such a high-density optical disk, we develop an exposure method using a photoresist mask. Super-resolution i s also studied in order to make the exposure beam diameter smaller.