Chopping frequency dependence of photoacoustic spectrum in porous silicon

Citation
T. Kawahara et al., Chopping frequency dependence of photoacoustic spectrum in porous silicon, JPN J A P 1, 39(2A), 2000, pp. 505-508
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
39
Issue
2A
Year of publication
2000
Pages
505 - 508
Database
ISI
SICI code
Abstract
The dependence of photoacoustic (PA) spectra on the chopping frequency in t he range of 10 to 180 Hz was studied in porous silicon (PS) samples of vary ing thicknesses the PS layer. The enhancement of PA signals over those of b ulk Si, reported in our previous work, is ascribed to the combined effects of interstitial gas 'pressure and intrinsic change of absorption. Although the enhancement seen in the long wavelengths, above 600 nm in the thick PS samples, is mainly caused by the "pressure" effect, the enhancement in the short wavelengths, below 600 nm, appears to be mainly due to the intrinsic effects related to the quantum confinement effect because it increases as t he porosity increases and seems to remain at higher chopping frequencies (f = 180 Hz). We could also estimate the thermal diffusivity of the PS sample s from the crossover frequency of the change of slope in the log PA signal vs the log chopping frequency plot. The dependencies of the PA spectral edg es on porosity and chopping frequency are shown and discussed in reference to the double layered structure model proposed in our previous work.