The goal of this study was to improve our understanding of diamond growth r
eactors. Direct relationships were set up between key parameters at a micro
scale level and diamond film characteristics. The coupled action of plasma
variables, such as microwave power density, substrate temperature, and perc
entage of methane, on the density of the key species that control diamond g
rowth was studied by spectroscopic diagnostics and modeling. The influence
of local conditions on the domain of validity of the Van der Drift model, w
hich describes texture development from a random distribution of diamond nu
clei, is discussed. The results suggested that different chemical kinetic m
odels, which depend on plasma conditions, must be used to describe "diamond
" growth by chemical vapor deposition. (C) 2000 The Electrochemical Society
. S0013-4651(99)08-102-1. FLU rights reserved.