Poly(5-((2-trimethylsilyl-2-propyl)oxycarbonyl)-norbornene-co-maleic anhydride) for 193-nm lithography

A copolymer of 5-((2-trimethylsilyl-2-propyl)oxycarbonyl)-norbornene and ma leic anhydride) was synthesized and evaluated as a chemically amplified res ist for ArF lithography. The polymer has excellent transmittance at 193 nm and possesses good thermal stability up to 195 degrees C, whereas in the pr esence of an acid the cleavage of the 2-trimethylsilyl-2-propyl ester group begins at 76 degrees C in a catalytic manner. The 0.18 mu m line and space patterns were obtained at a dose of 10 mJ cm(-2) using an ArF excimer lase r stepper. (C) 2000 Published by Elsevier Science Ltd. All rights reserved.