Temperature dependences of the photoconductivity of boron doped a-Si:H film
s both prior to and after prolonged illumination were studied. It was found
that the photoconductivity of films under study in the temperature range 2
00-300 K (intermediate temperatures) is independent of the doping level and
the concentration of deep recombination centers (dangling bonds). A model
of recombination is used to explain the experimental results; according to
this model, the occupancy function of neutral dangling bonds in p-type a-Si
:H (and, consequently, also the photoconductivity) is determined by the par
ameters of the states of the valence band tail and is independent of the do
ping level and of the total concentration of dangling bonds. (C) 2000 MAIK
"Nauka/Interperiodica".