Effect of nanocrystalline inclusions on the photosensitivity of amorphous hydrogenated silicon films

Authors
Golikova, OA Kazanin, MM
Citation
Oa. Golikova et Mm. Kazanin, Effect of nanocrystalline inclusions on the photosensitivity of amorphous hydrogenated silicon films, SEMICONDUCT, 34(6), 2000, pp. 737-740
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
34
Issue
6
Year of publication
2000
Pages
737 - 740
Database
ISI
SICI code
1063-7826(2000)34:6<737:EONIOT>2.0.ZU;2-N
Abstract
Photosensitivity of amorphous hydrogenated silicon films containing inclusi ons of Si nanocrystals, along with spectral characteristics of photoconduct ivity, were studied. A correlation between photosensitivity and features of the Raman spectra was established. The highest photosensitivity is observe d in films with medium-range order formed to the maximum extent. (C) 2000 M AIK "Nauka/Interperiodica".