Chemical analysis of the plasma-polymerized diphenyl thin films

Plasma-polymerized diphenyl (PPDP) thin films were prepared by glow dischar ge technique. The PPDP films were characterized by scanning electron micros copy (SEM), elemental analysis, infrared (IR) spectroscopy, Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). The surface morphology of the PPDP film is observed to be uniform and pinhole-free. The IR analysis reveals that the structure of PPDP thin film is different from that of the monomer diphenyl. The atomic ratios, O/C and N/C, of the PPDP film surfaces are found to be 0.25 and 0.04 by AES and those by XPS are 0.3 0 and 0.05, respectively. It is demonstrated that the chemical characterist ics of the PPDP thin films, as revealed by AES and XPS, are not much differ ent. It is found that the surface and bulk atomic concentrations of the con stituent elements are not identical. (C) 2000 Elsevier Science Ltd. All rig hts reserved.