Chemisorption pathways and Si 2p core-level shifts for the interaction of spherosiloxane clusters with Si(100): Implications for photoemission in Si/SiO2 systems

Citation
K. Raghavachari et al., Chemisorption pathways and Si 2p core-level shifts for the interaction of spherosiloxane clusters with Si(100): Implications for photoemission in Si/SiO2 systems, APPL PHYS L, 76(26), 2000, pp. 3873-3875
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
26
Year of publication
2000
Pages
3873 - 3875
Database
ISI
SICI code
0003-6951(20000626)76:26<3873:CPAS2C>2.0.ZU;2-Y
Abstract
Using a first-principles density functional approach, we investigate the ch emisorption mechanism for the interaction of spherosiloxane (H8Si8O12) clus ters on Si(100). Our transition state studies reveal that the chemisorption pathway with the lowest activation barrier corresponds to attachment via S i-O bond cleavage across a surface dimer. Using the relaxed surface structu re from this "cracked cluster" model, we calculate Si 2p core-level shifts, including core-hole relaxation effects, and show that the calculated value s are in excellent agreement with the positions and intensities of all the experimentally observed core-level shifts. (C) 2000 American Institute of P hysics. [S0003-6951(00)00526-X].