Selective electroless copper deposition within block copolymer microdomains

Citation
Y. Boontongkong et al., Selective electroless copper deposition within block copolymer microdomains, CHEM MATER, 12(6), 2000, pp. 1628-1633
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMISTRY OF MATERIALS
ISSN journal
08974756 → ACNP
Volume
12
Issue
6
Year of publication
2000
Pages
1628 - 1633
Database
ISI
SICI code
0897-4756(200006)12:6<1628:SECDWB>2.0.ZU;2-N
Abstract
We demonstrate a method for the directed formation of layered metallic copp er structure within the subsurface morphology of a bulk lamellar block copo lymer. Using an electroless deposition process, copper was selectively depo sited inside the interconnected microdomain network of the water-permeable block containing preloaded palladium ions. The relatively simple process yi elds a novel nanoscale composite consisting of alternating layers of metall ic copper with those of the hydrocarbon block matrix. The extent of the cop per deposition can be controlled by adjusting the deposition rate and depos ition time.